| 摘要 |
PURPOSE:To draw a predetermined figure by generating fundamental figures of different kinds by the scanning of rectangular electron beam with variable length and selecting the necessary figure. CONSTITUTION:The figure informations of a semiconductor device can generally be represented by the fundamental figures of five kinds, and can be expressed by beam-ON coordinates BON, OFF coordinates BOFF, rectangular electron beam length BL and angular informations A+ or -, B+ or -. Beam length after passing a rectangular iris 6 is expanded and contracted by the deflection of a circular beam 12a passing through a blanking iris. The amount of positional variation BS also changes in the beam length when deflection signals YS increases from on coordinates YN, and the BS are all constituted from the BL and (YS-YN)cotA or (YS-YN)cotB in each fundamental figure. The figure is divided into the fundamental figures of five kinds by means of a computer, the beam ON-OFF coordainates, angles, beam length informations, the starting of scanning, beam ON-OFF and the signals of a skip are generated, and the drawing device can draw the electron rays at high speed and with high accuracy even for an oblique figure. |
