发明名称 Semiconductor device.
摘要 A semiconductor device includes p- and n-type semiconductor layers formed on an insulating substrate and an n-type interconnection layer formed to be electrically coupled with said n-type semiconductor layer. The n-type interconnection layer is formed in contact with the p-type semiconductor layer and is set at such a potential as to apply a reverse voltage across the p-n junction between the n-type interconnection layer and p-type semiconductor layer, so as to electrically isolate the n-type interconnection layer from the p-type semiconductor layer.
申请公布号 EP0043930(A2) 申请公布日期 1982.01.20
申请号 EP19810104661 申请日期 1981.06.16
申请人 TOKYO SHIBAURA DENKI KABUSHIKI KAISHA 发明人 EGAWA, HIDEHARU;NISHI, YOSHIO;MAEGUCHI, KENJI
分类号 H01L23/52;H01L21/3205;H01L23/522;H01L23/532;H01L27/12;(IPC1-7):01L23/48;01L23/52 主分类号 H01L23/52
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