| 摘要 |
PURPOSE: A coating and developing apparatus, a method thereof, and a memory medium are provided to apply a unit block for a dual developing process, thereby suppressing the degradation of operation efficiency of the coating and developing apparatus. CONSTITUTION: A carrier block(S1) comprises a loading stand(11) which loads a carrier(C), an opening and closing part(12), and a transfer arm. The transfer arm comprises five wafer holding support parts in up and down directions. A processing block(S2) comprises unit blocks(B1-B6) which perform liquid processing process in a wafer. The unit block comprises a heating module, a main arm, and a return region. A liquid processing unit comprises an antireflection film formation module(BCT1, 2) and a resist film formation module(COT1,2). |
