发明名称 Method of stabilizing organic substrate materials to light
摘要 A method is described for stabilizing organic substrate materials having an absorption maximum in the range of from about 300 nm to 800 nm to light which comprises making at least one complex represented by the formula (I) coexist with the organic substrate materials in an amount effective to stabilize said organic substrate material: <IMAGE> (I) wherein M represents copper, cobalt, nickel, palladium or platinum, and R1 and R2 independently represent a hydrogen atom, an alkyl group, an aryl group, an acyl group, an N-alkylcarbamoyl group, an N-arylcarbamoyl group, or an N-alkylsulfamoyl group, an N-arylsulfamoyl group, an alkoxycarbonyl group or an aryloxycarbonyl group.
申请公布号 US4301223(A) 申请公布日期 1981.11.17
申请号 US19800151081 申请日期 1980.05.19
申请人 FUJI PHOTO FILM CO., LTD. 发明人 NAKAMURA, KOTARO;SUZUKI, YOSHIAKI;HARA, HIROSHI;SAWADA, SATORU;OONO, SHIGERU
分类号 G03C7/26;C08K5/00;C09B67/00;G03C1/06;G03C1/83;G03C7/392;(IPC1-7):G03C7/00 主分类号 G03C7/26
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