发明名称 PROCESO PARA PRODUCIR DERIVADOS DE PROPIONAMIDA DE DIBENZO- TIOPINA
摘要 <p>PURPOSE:To manufacture a cheap compound shadow mask of which small holes are very accurate, by forming a metal electro-deposied layer having small holes with required high precision on one side of the base of a specific electrytic iron foil and perforating the base by etching from the opposite side of the base foward the small holes. CONSTITUTION:Photosensitive resin layer 9, 9' are formed on both surfaces of electrolytic iron foil 1 of which thickness is 10-80mum and surface roughtness is Ra 0.1-5mum respectively, Then, the photosensitive resin 9 is left on the parts of one side A of the iron foil 1 which shall be provided with small holes when electro- depositing the second metal 2 by photochemical process or the like, and the photo- sensitive resin 9' is left on the opposite side B of the iron foil 1 so as to be perforated coaxially, toward the small holes, when the foil is etched later. Afterward, the second metal 2 is electro-deposited only on the surface A and then, the etching perforation is carried out from the opposite surface B coaxially with the small holes. Thereby, although the pitch of a mask is very fine, excellent accuracy of the small holes can be well secured.</p>
申请公布号 ES497810(D0) 申请公布日期 1981.11.16
申请号 ES20100004978 申请日期 1980.12.16
申请人 NIPPON CHEMIPHAR CO.LTD. 发明人
分类号 C25D7/00;H01J9/14;(IPC1-7):07D337/12;61K31/38 主分类号 C25D7/00
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