发明名称 SUBSTRATE PROCESSING METHOD
摘要 <p>Provided is a substrate processing method wherein efficiencies of drainage and exhaust by centrifugal force and a rotor are improved. The substrate processing method is provided with a sample stage (2) for placing a substrate (1) to be processed, a spin rotor (3) arranged in the sample stage (2), and a supply nozzle (4) for supplying a liquid from the center portion of the spin rotor (3). The liquid supplied from the supply nozzle (4) is discharged by rotation of the spin rotor (3) in the outer circumference direction of the substrate (1) to be processed.</p>
申请公布号 WO2009075060(A1) 申请公布日期 2009.06.18
申请号 WO2008JP03316 申请日期 2008.11.14
申请人 REALIZE ADVANCED TECHNOLOGY LIMITED;MATSUZAWA, MINORU;YOSHIKAWA, KAZUHIRO 发明人 MATSUZAWA, MINORU;YOSHIKAWA, KAZUHIRO
分类号 H01L21/304;H01L21/027;H01L21/306 主分类号 H01L21/304
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