| 摘要 |
PURPOSE:To obtain a micropattern by overlapping a photoresist film on a photosensitized photoresist film and subjecting them to exposure and development. CONSTITUTION:An aluminum film 2 is adhered to a SiO2 sheet 1, and then is coated with a photoresist 4. After this process, an ultraviolet ray is exposed to the said photoregist. Next, a photoresist 5 is applied and is exposed holographically to a laser beam. A regist film forms a diffraction grating pattern 6 on the surface of the aluminum film after development process. Since the resist film 4 is exposed beforehand, a residual resist is not left in a valley of the diffraction grating pattern on account of a flickering light. If gold 2 is etched by the mask 6 in an argon ion atmosphere, an extremely fine pattern can be obtained. |
