PRODUCTION OF THIN FILM BY SPUTTERING

摘要

PURPOSE:To obtain a thin film excellent in the photoelectric and optical properties for a higher frequency sputtering by molding an inorganic material into a target under pressure at a low temperature with no binder. CONSTITUTION:A powdered material of an inorganic substance is molded into a target 3 under pressure at a normal temperature or a temperature range free from chemical change with no binder. The target 3 is placed on a cathode 2 in a vacuum discharge box 1 while a glass substrate 5 is fixed on an anode 4. A high frequency discharging is performed between the cathode 2 and the anode 4 by a high frequency power source 8 to form a sputtering film 6 on the substrate 5. This keeps the target 3 from mixture with impurities and chemical changes thereby providing a thin film highly excellent in the photoelectric and optical properties.