发明名称 COUPLING AGENT FOR INORGANIC INSULATING FILM CONTAINING SILICON AND POLYIMIDE RESIN FILM
摘要 PURPOSE:To attain uniform bonding strength by improving the bonding between Si- containing inorganic insulating film and polyimide resin film, by using a coupling agent consisting of 0.01-50wt% organozirconium chelate compound and an organic solvent. CONSTITUTION:A coupling agent is prepared from 0.01-50wt% organozirconium chelate compound, such as tetrakisacetylacetonatozirconium or monobutoxytrisacetylacetonatozirconium, and a solvent dissolving said chelate compound or a dispersant forming a colloidal solution therewith, preferably a solvent such as benzene or toluene. When the amount of said chelate compound is below 0.01wt%, the bonding between Si substrate and polyimide resin film cannot be improved. When the amount is above 50wt%, the coupling agent coating becomes too thick to obtain uniform bond strength.
申请公布号 JPS56131949(A) 申请公布日期 1981.10.15
申请号 JP19800034004 申请日期 1980.03.19
申请人 TOKYO SHIBAURA ELECTRIC CO 发明人 FUJIEDA SHINETSU;KOKUNI NAOYUKI;SUZUKI SHIYUICHI
分类号 H01L21/768;C09D179/08;C09J11/00;H01L21/312;H01L21/3205;H01L23/29;H01L23/31;H01L23/522 主分类号 H01L21/768
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