发明名称 MANUFACTURE OF SEMICONDUCTOR DEVICE
摘要 PURPOSE:To form an active layer having preferable crystallinity by growing the III-V Group semiconductor layer in the Periodic Table containing non P on the first semiconductor layer containing P provided on a substrate and isolating the first semiconductor layer from the growing atmosphere. CONSTITUTION:After a semiconductor layer InGaAlP layer 11 containing P becoming an active layer is grown on a GaAs substrate 10, a semiconductor layer GaAs layer 12 containing non P is matched at lattice therewith and grown, and Zn or the like is diffused via the layer 12 in the layer 11, thereby form a P-N junction. Thus, since the layer 11 is isolated from the growing atmosphere, the P does not remove from the surface to become rough, but the active layer having preferably crystallinity can be obtained.
申请公布号 JPS56130913(A) 申请公布日期 1981.10.14
申请号 JP19800035036 申请日期 1980.03.18
申请人 MATSUSHITA ELECTRIC IND CO LTD 发明人 OOTA KAZUNARI;KAZUMURA MASARU;YAMANAKA HARUYOSHI
分类号 H01L21/208;H01L33/30;H01L33/40;H01S5/00 主分类号 H01L21/208
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