| 摘要 |
PURPOSE:To make it possible to copy a fine pattern below 1mu, by irradiating repeatedly at more than 10 pulses per second the pulse output of laser beam of several or tens of joules. CONSTITUTION:Plasma 39 and X-rays 40 are generated by concentrated 37 beams on a metal target 38 in a vacuum bulb 36. A mask 43 and a substrate 44 in an exposure room 42 filled with He of one atmospheric pressure are irradiated through a window 49. The intensity of the X-ray is detected 45 on the identical position with the substrate. As the laser pulse outputs increasic, pressure cooling effect of oscillation decreases and the repetition speed of the pulses decreases. If the speed is accelerated forcibly, the radiation deteriorates. A combined use of the YAG laser and glass laser results in repeated irradiation of high output laser beams of several or tens of joules at about 10 pulse per second. Thus exposure of very fine resist pattern can be performed in a short time. |
