| 摘要 |
PURPOSE:To drill an uniform passing hole of a electron beam at all times, by controlling the travelling speed of the material for shadow mask in response to the thickness of the plate. CONSTITUTION:In an exposure process, an unexposed layer of photosensitive resin at the required position of a flat mask 35 is removed, while a photosensitive layer at a plate thickness measuring point 36 of the flat mask 35 is also removed. The thickness of a plate of shadow mask material 22 at the plate thickness measuring point 36 is measured with a plate thickness measuring instrument 29. When the measured results are transmitted as signals to a controlling device 30, it carries out calculation of those signals from the plate thickness measuring instrument 29 and trousmits signals for controlling the travelling speed of the shadow mask material 22 to motors 251 and 261. |
