发明名称 VAPORIZING PROCESS OF LOW TEMPERATURE LIQUEFIED GAS
摘要 <p>PURPOSE:To prevent freezing of heat source in a vaporizer in such a way that an ejector is installed in the midst between the vaporizer and a liquid feeding pump, and part of vaporized liquefied gas is returned to the ejector, so as to heat liquefied gas. CONSTITUTION:Liquefied gas in liquid form below about 0 deg.C in a low temperature tank 11 passes through a piping 12, boosted to a determined pressure by an oil pump 13, pases through an ejector 15 installed in a piping 14 and arrives at a vaporizer 16. Liquefied gas vaporized by heat source 17 in the vaporizer 16 is fed to a piping 18, part of which is returned through a piping 19 to the ejector 15. In this ejector 15, the fed back vaporized liquefied gas is mixed in the liquefied gas in liquid form below about 0 deg.C fed from a liquid pump 13, the liquefied gas in liquid form is heated by condensed potential heat of vaporized liquefied gas, and the temperature is maintained at more than about 0 deg.C in the vicinity of the inlet port of the vaporizer. By this process, the inside of the vaporizer 16 is maintained at a constant temperature more than about 0 deg.C during its operation.</p>
申请公布号 JPS5694096(A) 申请公布日期 1981.07.30
申请号 JP19790173472 申请日期 1979.12.26
申请人 HITACHI SHIPBUILDING ENG CO 发明人 MISHIMA REIJI
分类号 F17C9/02;(IPC1-7):17C9/02 主分类号 F17C9/02
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