发明名称 PLANATARY TYPE VACUUM DEPOSITION APPARATUS
摘要 PURPOSE:To enable the body to be vapor-deposited of a uniform distribution and a good step coverage to be obtained by forming the dome surface of a planetary jig with a polyhedron having difference of the surface levels and making the inclination angles and a level difference of the surface thereof larger the nearer on the outside circumference of the dome. CONSTITUTION:While a holding jig 1 is revolving around the perpendicular axial line passing a vapor source in a vacuum vessel, it rotates around the central axis. The materials 6 to be vapor-deposited are disposed at an equal interval on the concentrical parts 7, 8 of the dome of the jig 1. The dome is formed of a polyhedron having levels difference of the surface of the concentrical parts 7, 8, and the curvature of the concentrical part of the innermost stage, that is, the part of the minimum diameter of the pitch circles is formed as rising angle, and the dome is so constituted that the level difference of the surface and the rising angles are larger as the steps go nearer the outside circumference. Thereby, the errors for the preset incident angle are minimized, and the film of good distribution and step coverage is vacuum evaporated.
申请公布号 JPS5690973(A) 申请公布日期 1981.07.23
申请号 JP19790165606 申请日期 1979.12.21
申请人 ULVAC CORP 发明人 TSUCHIYA KOUYOU
分类号 C23C14/50;H01L21/285 主分类号 C23C14/50
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