发明名称 Apparatus and method for providing electron beam patterns using expanded beam array.
摘要 <p>An apparatus and method for forming scanned electron beam patterns which finds particular use in multiple beam cathode ray tubes. Instead of using the vertical line array of electron beam sources which is used in conventional multiple beam tubes, a two dimensional expanded beam array (30,31, 32, 74) is provided. The expanded array is such that no two electron beams in the array are disposed in the same scan line and it is of a geometric shape having comparable length and width dimensions. in order to form characters or other patterns logic circuitry (80-120) is provided to control each beam of the expanded array at respective scanning positions as the array is deflected or scanned across the screen of the cathode ray tube.</p>
申请公布号 EP0031010(A1) 申请公布日期 1981.07.01
申请号 EP19800106635 申请日期 1980.10.29
申请人 INTERNATIONAL BUSINESS MACHINES CORPORATION 发明人 BECK, VERNON DAVID
分类号 H01J31/08;G06T11/00;G09G1/20;H01J31/12;(IPC1-7):09G1/20;01J31/15 主分类号 H01J31/08
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