| 摘要 |
A process for photolithographically producing matt diffusion patterns is disclosed. The matt diffusion patterns can be formed along with opaque and transparent patterns on the same pattern carrier plate. According to this process, a photoexposure mask corresponding to the desired matt pattern is made by photolithography, which mask is then used in subsequent photolithographic processes to form the matt diffusion pattern on pattern carrier plates. The process of making the exposure mask involves forming a mask of a desired diffusion pattern, applying a photoresist layer to the mask, exposing the photoresist layer through a diffusion plate, developing the photoresist layer, applying an opaque layer to the mask, and removing the photoresist layer. In subsequent photolithographic processes the exposure mask is printed on transparent pattern carrier plates, and the exposed areas of the pattern carrier plates are deeply etched to form the matt diffusion patterns. |
