发明名称 |
MAT FILM WHICH CAN BE WRITTEN AND CORRECTED |
摘要 |
<p>A drafting film comprising a hydrophobic support and a matte layer formed thereon, said matte layer comprising silicon dioxide as a matting agent and a mixture of polymethyl methacrylate or a copolymer thereof and nitrocellulose. The drafting film show excellent adaptability for writing or drawing and revising or erasing. A wash-off type photographic film is also provided by forming a wash-off silver halide photosensitive emulsion layer on the drafting film.</p> |
申请公布号 |
JPS5653067(A) |
申请公布日期 |
1981.05.12 |
申请号 |
JP19790129774 |
申请日期 |
1979.10.08 |
申请人 |
FUJI PHOTO FILM CO LTD |
发明人 |
SHINAGAWA YUKIO;OOTANI SUMIO;SUEMATSU KOUICHI;KAWAGUCHI HIDEO |
分类号 |
G03C1/32;B32B27/00;B32B27/20;B44D3/18;G03C1/76;G03C1/95 |
主分类号 |
G03C1/32 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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