发明名称 MAT FILM WHICH CAN BE WRITTEN AND CORRECTED
摘要 <p>A drafting film comprising a hydrophobic support and a matte layer formed thereon, said matte layer comprising silicon dioxide as a matting agent and a mixture of polymethyl methacrylate or a copolymer thereof and nitrocellulose. The drafting film show excellent adaptability for writing or drawing and revising or erasing. A wash-off type photographic film is also provided by forming a wash-off silver halide photosensitive emulsion layer on the drafting film.</p>
申请公布号 JPS5653067(A) 申请公布日期 1981.05.12
申请号 JP19790129774 申请日期 1979.10.08
申请人 FUJI PHOTO FILM CO LTD 发明人 SHINAGAWA YUKIO;OOTANI SUMIO;SUEMATSU KOUICHI;KAWAGUCHI HIDEO
分类号 G03C1/32;B32B27/00;B32B27/20;B44D3/18;G03C1/76;G03C1/95 主分类号 G03C1/32
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