| 摘要 |
PURPOSE:To simplify vapor depositing apparatus and to form appropriate film pattern, by using plural masks and mask holders, and by placing a mask partly upon another mask. CONSTITUTION:A mask is divided into 2A, 2B in the longitudinal direction of a stripe film pattern. On the masks 2A, 2B are made stripe slit groups 21A, 21B formed by division in suitable length in accordance with density of the stripe pattern, and the groups 21A, 21B are so laid out that, when the masks 2A, 2B are placed one upon another, the slits continue and end parts are piled up. Masks are put together by using these masks 2A, 2B and plural mask holders so as to form a portion of film pattern with one mask and the residual part of the film pattern with another mask thereby forming prescribed film pattern by two run of vapor depositing operation which complements each other. This method allows to improve the quality of vapor deposition. |
