发明名称 PRE-TREATING APPARATUS FOR CHEMICAL PLATING
摘要 Pre-treating apparatus of this invention consists of the removing fat chamber(5), the first washing chamber(6), the first activation chamber(7), the second washing chamber(8), the second activation chamber(9) and the third washing chamber(10). Conveyer(20) and ejection(21) mechanisms are set up in each chamber. The ejection mechanisms are attached to multi-turnout pipes(23) consisting of small cavities which can directly spray paint to the plated-materials(1).
申请公布号 KR810000020(B1) 申请公布日期 1981.02.02
申请号 KR19740001213 申请日期 1974.01.19
申请人 SONY CO LTD 发明人 YAMATA TOYOJI;FUEKI SHIMETOMO;IKEKAI YUUJI
分类号 C23G5/04;(IPC1-7):C23G5/04 主分类号 C23G5/04
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