| 摘要 |
This disclosure deals with a new process and apparatus for using a critically adjusted electron beam to cure protective and decorative coatings, including opaque, heavily pigmented coatings, on paper, fabric and other thin substrates which are sensitive to heat or various forms of radiation. The process utilizes restricted dose, energy and process rates to obviate degradation of the substrate during curing and to achieve previously unattainable line speeds in the curing of coatings on products of web, sheet and filamentary geometry.
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