| 摘要 |
PURPOSE:To process a work at a high processing speed with high energy efficiency by conducting electricity to an electrolytic material layer formed atop the work surface to generate a chemical reactive medium and irradiating a high-energy beam to the work surface. CONSTITUTION:The electrolytic material layer 9 is formed on the surface of the work 10 such as insulator or semiconductor by using a soln. or coating material of halide such as CaF2 or hydroxide such as KOH and electricity is conducted through electrodes 11, 12 to said layer from a power source 3 to generate the chemical reactive medium. The laser beam 8 generated by a laser oscillator 7 is irradiated to the work surface via a reflection mirror 6, a lens 5, etc. The irradiating point is thereby melted and is brought into chemical reaction with the reactive medium and the processing is accelerated by oxidation, reduction and halogenation etching. A working table 6 is moved and controlled to an X-axis and a Y-axis by an NC control device 2 by which the work is marked to a desired shape. |
