发明名称 |
GALLIUM NITRIDE LIGHT EMITTING ELEMENT AND ITS MANUFACTURE |
摘要 |
PURPOSE:To improve light emitting efficiency of a GaN light emitting element by a method wherein a GaN layer is well adapted to a heat oxide film employed and occurrence of a non-radiation re-coupling center is suppressed at the adapted area. CONSTITUTION:An n-type GaN 6 doped slightly with Zn on the surface (0001) of a sapphire 1 is pre-heated on a place in a foreground to a constant heat portion inside a furnace, and then placed on a specified position. N2 gas flow path is switched over to make the gas flow through a bubbler 8 filled with disfilled water. Quantity of water vapor supplied is controlled through both the temperature of a constant temperature oven 9 and the N2 gas flow regulated by a flow meter 12. Thus a heat- oxide film 20 is created on the surface of GaN2. An electrode 4 is vaccum-evaporated thereto, and an In dot electrode 5 is attached to one side thereof. By this constitution, a homogeneous insulated-film adapted to GaN can be obtained so that a device of high light emitting efficiency is produced. |
申请公布号 |
JPS55138286(A) |
申请公布日期 |
1980.10.28 |
申请号 |
JP19790045658 |
申请日期 |
1979.04.13 |
申请人 |
MATSUSHITA ELECTRIC IND CO LTD |
发明人 |
OOKI YOSHIMASA;TOYODA YUKIO;KOBAYASHI ATSUYUKI;HASHIMOTO MASAFUMI;AKASAKI ISAMU |
分类号 |
H01L21/205;H01L21/318;H01L29/47;H01L29/872;H01L33/16;H01L33/32;H01L33/40 |
主分类号 |
H01L21/205 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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