发明名称 Film forming method
摘要 A film forming method for obtaining a thin film by laminating molecular layers of oxide on a surface of a substrate in a vacuum atmosphere includes performing a cycle a plurality of times. The cycle includes: supplying a source gas containing a source to the substrate in a vacuum vessel to adsorb the source onto the substrate; forming an ozone atmosphere containing ozone having a concentration not less than that where a chain decomposition reaction is caused in the vacuum vessel; and forcibly decomposing the ozone by supplying energy to the ozone atmosphere to generate active species of oxygen, and oxidizing the source adsorbed onto the surface of the substrate by the active species to obtain the oxide.
申请公布号 US9425071(B2) 申请公布日期 2016.08.23
申请号 US201514698273 申请日期 2015.04.28
申请人 TOKYO ELECTRON LIMITED;IWATANI CORPORATION 发明人 Yabe Kazuo;Shimizu Akira;Izumi Koichi;Furutani Masahiro
分类号 H01L21/02;H01L21/67;C23C16/40;C23C16/455 主分类号 H01L21/02
代理机构 Nath, Goldberg & Meyer 代理人 Nath, Goldberg & Meyer ;Meyer Jerald L.
主权项 1. A film forming method for obtaining a thin film by laminating molecular layers of oxide on a surface of a substrate in a vacuum atmosphere, the method comprising performing a cycle a plurality of times, the cycle including: supplying a source gas containing a source to the substrate in a vacuum vessel to adsorb the source onto the substrate; forming an ozone atmosphere containing ozone having a concentration (Vol %) not less than that where a chain decomposition reaction is caused in the vacuum vessel; and forcibly decomposing the ozone by supplying energy to the ozone atmosphere to generate active species of oxygen, and oxidizing the source adsorbed onto the surface of the substrate by the active species to obtain the oxide, wherein oxidizing the source comprises supplying a reaction gas for causing the forcible decomposition by chemically reacting with the ozone to the ozone atmosphere, and wherein the reaction gas is nitrogen monoxide.
地址 Tokyo JP