| 摘要 |
PURPOSE:To make it unnecessary to apply a oxygen shielding film and to attain a low cost by heating a resist and exposing it so that polymerization is simultaneously executed with light and heat. CONSTITUTION:A sample 3 where the resist 1 made of acryloid-based photosensitive resin is applied on a base material 2 is held on a sample board 5 equipped with a heating heater 4. And a mask 9, held on a mask holding board 7, to which a desirable pattern is printed is brought in to contact with the sample 3. After the temperature of sample or the temperature of sample board attains a specific temperature, an exposure shutter 12 is opened to start exposure. At such a time, thermal polymerization is performed as soon as a generated radical combines with a monomer and the combination is executed at a fast polymerizing speed. Thus, a stage for applying the oxygen shielding film is not needed and the reduction of the cost can be attained. |
