发明名称 PLASMA CVD ELECTRODE
摘要 PURPOSE:To obtain a distribution of a uniform film thickness on the substrate by increasing the distance between the electrode and the substrate from the central part to the end part of the electrode gradually. CONSTITUTION:The distance D between the electrode 3 and the substrate holder 4 (actually, distance between the electrode and the material to be coated) at the circumferential part is made greater than that at the central part. When the diameter of the central part of the electrode, outside diameter of the electrode and distance D are properly selected, a distribution of a uniform film thickness can be obtaned at a greater attaching speed.
申请公布号 JPS55115336(A) 申请公布日期 1980.09.05
申请号 JP19790021695 申请日期 1979.02.26
申请人 NICHIDEN VARIAN KK 发明人 MITO HIDEO;OONO YOSHIAKI
分类号 H01L21/31;C23C16/50 主分类号 H01L21/31
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