发明名称 DRY TYPE CUTTING METHOD
摘要 PURPOSE:To cut a work, such as a silicon wafer, by a dry type grinding wheel by blowing an inert gas against the work at the cutting position. CONSTITUTION:Cooled and vaporized nitrogne gas is blown through a nozzle 6 against the cutting position. The jet of nitrogen gas eliminates oxygen and cools the working cutting edge of the griding wheel 3 and the silicon wafer 1 at the cutting position so that the silicon wafer 1 is cut by the grinding wheel 3 in the dry state. The cutting device of this dry type cutting method is applicable to a variety of cutting purposes and capable of severing works having considerable thickness.
申请公布号 JPS55112761(A) 申请公布日期 1980.08.30
申请号 JP19790018715 申请日期 1979.02.20
申请人 发明人
分类号 B24B27/06;B24B1/00;B24B55/02;B26D7/08;B28D1/22 主分类号 B24B27/06
代理机构 代理人
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