Passivating chemically deposited nickel-phosphorus layer - by immediately treating with soln. contg. oxygen and/or peroxide

摘要

Chemically deposited Ni-P layers are treated immediately after deposition with a soln. contg. O2 and/or a peroxide to form a passive surface layer. The treatment soln. can consist of (a) O2 bubbling through fresh water, (b) an H2O2 soln. esp. an NH4OH-contg. H2O2 soln. or (c) a soln. contg. an easily hydrolysable peroxide or peroxy cpd. The Ni-P layer is freed from plating soln. and oxidised "in statu nascendi". Surface resistance change of treated Ni-P thin layer resistances having surface resistance 20 OMEGA/sq changes by less than +2% after accelerated ageing.