| 摘要 |
PURPOSE:To leave all directional streaks which cancel the abrasion streaks due to rotational oscillation by allowing a polishing machine to rotate with a larger radius than the radius of rotational oscillation along the polshing surface and by advancing the machine in a necessary direction. CONSTITUTION:In order to allow the horizontal oscillating plate 3 having rubber plate underside to be revolved in oscillation by an eccentric shaft 4 which is fitted freely at the center part of the upper surface of a rotational oscillation polishing machine, the machine is equipped with a revolution body 5 equipped with an eccentric weight and a body 6 in which a driving motor is stored, and unevenness is formed regularly on the whole surface of the abrasive cloth 2 fitting surface of a rubber plate 1, corresponding to the unevenness of the surface to be polished. In polishing, the polishing machine is shifted in order along the surface of polish and is advanced in a necessary direction, allowing the machine to be rotated with a larger radius than the radius of rotational oscillation, and thus all directional streaks are left which cancel the abrasion streaks due to rotaional oscillation and the abrasion streaks due to the transfer of the polishing machine. |
