发明名称 ELECTRON BEAM EXPOSURE DEVICE
摘要 PURPOSE:To enable to draw even a picture of 2mum or less by connecting a modulation circuit that controls electron beam current to a blanking plate that makes up the exposure device and connecting a deflecting circuit for positioning the electron beam to a deflecting plate and by controlling these by means of a computer and an interface. CONSTITUTION:Electron beam from the electron gun 501 is accelerated by the anode 502, converged by the first condenser lens 503, and is done by the second condenser lens 505 through the blanking plate 504. Next the electron beam is defected by the deflecting plate 506, and is applied to the sample 10 through the object lens 507. In this constitution, the blanking plate 504 is connected to the modulation circuit 508 that controls electron beam current, and the deflecting plate 506 is done to the deflecting circuit 509 that positions the electron beam. Also both the circuits 508, 509 are connected to each other with a connection 512, the interface 510 is provided between both the circuits 508, 509 and the computer 511 that controls said circuits 508, 509.
申请公布号 JPS5562730(A) 申请公布日期 1980.05.12
申请号 JP19780134452 申请日期 1978.11.02
申请人 TOKYO SHIBAURA ELECTRIC CO 发明人 MOTOYAMA KAKUKI;TAKIGAWA TADAHIRO
分类号 H01J37/147;H01J37/302;H01L21/027 主分类号 H01J37/147
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