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发明名称
VERFAHREN ZUR EISENIONENIMPLANTATION IN EIN HALBLEITERSUBSTRAT
摘要
申请公布号
DE2838545(A1)
申请公布日期
1980.03.20
申请号
DE19782838545
申请日期
1978.09.04
申请人
SONY CORP.
发明人
MATSUSHITA,TAKESHI;HAYASHI,HISAO;MAMINE,TAKAYOSHI;NISHIYAMA,KAZUO
分类号
H01L21/22;H01L29/167;(IPC1-7):H01L21/265
主分类号
H01L21/22
代理机构
代理人
主权项
地址
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