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发明名称
PROCEDIMENTO PER LA FABBRICAZIONE DI UN DISPOSITIVO SEMICONDUTTORE AD OSSIDO METALLICO CON CONTATTI AUTOALLINEATI.
摘要
申请公布号
IT8019078(D0)
申请公布日期
1980.01.08
申请号
IT19800019078
申请日期
1980.01.08
申请人
AMERICAN MICRO SYST
发明人
LAL BATRA TARSAIM
分类号
H01L21/28;H01L21/3205;H01L21/336;H01L21/762;H01L23/52;H01L27/112;H01L29/78;(IPC1-7):H01L/
主分类号
H01L21/28
代理机构
代理人
主权项
地址
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