发明名称 ELECTRON BEAM EXPOSURE APPARATUS
摘要 PURPOSE:To adjust the rotation of the beam with a simple construction by a magnetic field generating means for generating forward and reverse magnetic field with respect to the direction of the electron beam using two magnets in a scanning electron beam exposure apparatus. CONSTITUTION:A non-rotary electronic lens is composed of an electron beam projection means for projecting the electron beam to the optical axis comprising coils 2 and 3 and a DC power source 5a and pole pieces 7 to 10 which are adapted to form an electron lens on which the electron beam forms an image after projected from the projection means. Deflecting plates 26a and 26b are arranged between a rectangular aperture 32 and the electronic lens 23 and 24 to deflect the electron beam between the projection means and the lenses. A magnetic field is generated toward the electronic lenses 23 and 24 in the forward or reverse direction with respect to the electron beam. Information from a detector 12 is applied to an calculator 16 through an amplifier 14 and the output of the calculator 16 controls the deflecting plates 26a and 26b to adjust the rotation of the beam.
申请公布号 JPS551186(A) 申请公布日期 1980.01.07
申请号 JP19790049094 申请日期 1979.04.23
申请人 TOKYO SHIBAURA ELECTRIC CO 发明人 TAKIGAWA TADAHIRO
分类号 H01L21/027;H01J37/141 主分类号 H01L21/027
代理机构 代理人
主权项
地址