| 摘要 |
PURPOSE:To enable the detection of the presence of a residue of a thin film left on a metal pattern at a contact hole part by varying the wavelength of light irradiated to the contact hole part of an object to be inspected continuously to check a change in the intensity of reflected light thereof. CONSTITUTION:Light providing a continuous spectrum is emitted from a xenon lamp 1 to extract light alone with a narrow band wavelength by a monochrometer 2 therefrom. Then, the light with the wavelength extracted by the meter 2 is made to irradiate a contact hole part 53 of an object 5 to be inspected through a half mirror 3 and an objective lens 4. Reflected light from the hole part 53 is condensed with the lens 4 and the intensity thereof is introduced to a photomultiplier 6 with the mirror 3. By the operation of the meter 2, the prism of the meter 2 is turned to vary the wavelength of light irradiated to the hole part 53 continuously to check a change in the intensity of the light detected with the photomultiplier 6 thereby enabling the detection of a residue of a thin film. |
