| 发明名称 |
HOGKENSLIG RESISTBELEGGNING BESTAENDE AV ETT FLERTAL SKIKT PA ETT SUBSTRAT |
| 摘要 |
<p>A high sensitivity resist layer structure for high energy radiation exposure is formed by coating plural layers of radiation degradable polymers on a substrate which layers are successively slower dissolving in the resist developer. Upon exposure and solvent development, a resist edge profile is obtained which is particularly useful for metal lift-off.</p> |
| 申请公布号 |
SE410997(B) |
申请公布日期 |
1979.11.19 |
| 申请号 |
SE19740015451 |
申请日期 |
1974.12.10 |
| 申请人 |
* INTERNATIONAL BUSINESS MACHINES CORPORATION |
发明人 |
W M * MOREAU;C H * TING |
| 分类号 |
G03F7/039;G03F1/68;G03F7/095;G03F7/26;H01L21/027;H01L21/3205;H05K3/02;(IPC1-7):32B7/02;03C1/72;03C5/00;05K3/00 |
主分类号 |
G03F7/039 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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