发明名称 DEPOSITING METHOD BY USE OF ELECTRON BEAM
摘要 PURPOSE:To prepare uniformly deposited film on a material to be deposited, by shaping a depositing material mass having no cavities in it into a form same as that of a holding concave made on the surface of an evaporation dish, and by putting the material into the concave without; forming vacant space between the depositing material and holding concave.
申请公布号 JPS5423084(A) 申请公布日期 1979.02.21
申请号 JP19770087414 申请日期 1977.07.22
申请人 HITACHI LTD 发明人 YOSHIDA HIROBUMI
分类号 C23C14/24;C23C14/30 主分类号 C23C14/24
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