发明名称 |
EXHAUST SYSTEM EQUIPPED WITH MASS SEPARATION MECHANISM |
摘要 |
PROBLEM TO BE SOLVED: To prevent generation of gas molecules and sputter particles generated by impact of other gas ions except sputtered metal ions on the inner wall of a wave guide in an ion accelerator equipped with a sputter type ion source and a mass separation mechanism to reduce the mixing of impurities on the downstream side. SOLUTION: For the ion accelerator equipped with a sputter type ion source and a mass separation mechanism and adapted to implant metal ions in a target to be irradiated, a layer of active metals such as Ti+Ta is provided on the inner wall of a wave guide of the mass separation mechanism.
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申请公布号 |
JP2002015696(A) |
申请公布日期 |
2002.01.18 |
申请号 |
JP20000196357 |
申请日期 |
2000.06.29 |
申请人 |
ULVAC JAPAN LTD |
发明人 |
AGAWA YOSHIAKI;ASAMI KATSUHIKO;KIKUCHI MICHIO;SAITOU KESAMI |
分类号 |
G01N27/62;C23C14/48;H01J27/22;H01J37/08;H01J37/18;H01J37/317;H01L21/302;H01L21/3065;(IPC1-7):H01J37/317;H01L21/306 |
主分类号 |
G01N27/62 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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