发明名称 EXHAUST SYSTEM EQUIPPED WITH MASS SEPARATION MECHANISM
摘要 PROBLEM TO BE SOLVED: To prevent generation of gas molecules and sputter particles generated by impact of other gas ions except sputtered metal ions on the inner wall of a wave guide in an ion accelerator equipped with a sputter type ion source and a mass separation mechanism to reduce the mixing of impurities on the downstream side. SOLUTION: For the ion accelerator equipped with a sputter type ion source and a mass separation mechanism and adapted to implant metal ions in a target to be irradiated, a layer of active metals such as Ti+Ta is provided on the inner wall of a wave guide of the mass separation mechanism.
申请公布号 JP2002015696(A) 申请公布日期 2002.01.18
申请号 JP20000196357 申请日期 2000.06.29
申请人 ULVAC JAPAN LTD 发明人 AGAWA YOSHIAKI;ASAMI KATSUHIKO;KIKUCHI MICHIO;SAITOU KESAMI
分类号 G01N27/62;C23C14/48;H01J27/22;H01J37/08;H01J37/18;H01J37/317;H01L21/302;H01L21/3065;(IPC1-7):H01J37/317;H01L21/306 主分类号 G01N27/62
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