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发明名称
METHOD AND APPARATUS FOR MASK PATTERN EXPOSURE
摘要
PURPOSE:To simplify the estimate positioning operation and to ealize the method and apparatus for mask pattern exposure of high accuracy even in case of using a film.
申请公布号
JPS5396678(A)
申请公布日期
1978.08.24
申请号
JP19770010695
申请日期
1977.02.04
申请人
HITACHI LTD
发明人
SHIOI HIDEJI
分类号
H01L21/027;G03F7/20
主分类号
H01L21/027
代理机构
代理人
主权项
地址
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