| 发明名称 |
IIL TYPE SEMICONDUCTOR DEVICE |
| 摘要 |
PURPOSE:To reduce the variations in mean gate delay time and provide an IIL of a uniform quality by controlling the spacing of an epitaxial layer. |
| 申请公布号 |
JPS5385182(A) |
申请公布日期 |
1978.07.27 |
| 申请号 |
JP19770000047 |
申请日期 |
1977.01.05 |
| 申请人 |
HITACHI LTD |
发明人 |
USAMI MITSUO |
| 分类号 |
H01L21/8226;H01L21/331;H01L27/02;H01L27/082;H01L29/73 |
主分类号 |
H01L21/8226 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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