| 发明名称 |
MASK FORMING METHOD |
| 摘要 |
PURPOSE:To improve the adhesion between both and produce a mask of precision patterns by interposing a surface treating agent layer between a substrate and a resist layer and heating the layer to make it insoluble with resist developing solutions. |
| 申请公布号 |
JPS5381079(A) |
申请公布日期 |
1978.07.18 |
| 申请号 |
JP19760158382 |
申请日期 |
1976.12.27 |
| 申请人 |
FUJITSU LTD |
发明人 |
YONEDA YASUHIRO;KITAKOUJI TOSHISUKE;KITAMURA TATEO;FUJIMORI MASATOSHI |
| 分类号 |
G03F1/00;G03F1/68;G03F1/80;H01L21/027;H01L21/302 |
主分类号 |
G03F1/00 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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