METHOD OF DEPOSITING A THIN FILM OF MAGNETIC IRON-SILICON UPON A SUBSTRATE AND PRODUCT THEREOF

摘要

1513851 Sputtering Fe-Si INTERNATIONAL BUSINESS MACHINES CORP 4 Feb 1977 [26 Feb 1976] 04600/77 Heading C7F A thin film of magnetic Fe-Si is sputter deposited upon a substrate e.g. on oxidized silicon wafer which is at a temperature above 250‹C. The film may contain 5 to 7% Si may be of thickness 0À4 to 10 microns and may be laminated with SiO 2 insulation between the layers. Parts of the film may be removed by resist process or sputter etching and the remaining film may have a Ti or Cr adhesion layer vapour deposited thereon which is then plated with Cu. The product may be used as a Tape Head.