| 摘要 |
An etching process for patterning cermet thin film resistors includes the provision of a layer of molybdenum over the cermet layer to provide a good adherent surface for a photoresist layer subsequently deposited thereon. After the photoresist and molybdenum layers are patterned in separate steps, the cermet is preferentially etched with hot phosphoric acid to produce the desired cermet resistance pattern.
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