| 发明名称 |
High energy radiation exposed positive resist mask process |
| 摘要 |
The development of high energy radiation exposed positive acrylate polymer resist layers by organic liquid developers, such as methyl isobutyl ketone, is improved by adding water to the ketone.
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| 申请公布号 |
US4078098(A) |
申请公布日期 |
1978.03.07 |
| 申请号 |
US19740473603 |
申请日期 |
1974.05.28 |
| 申请人 |
INTERNATIONAL BUSINESS MACHINES CORPORATION |
发明人 |
CORTELLINO, CHARLES A. |
| 分类号 |
G03F7/039;G03F7/30;G03F7/32;H05K3/06;(IPC1-7):B05D3/06 |
主分类号 |
G03F7/039 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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