| 摘要 |
An ion microprobe analyzer adapted for use in effecting the solid analysis of a specimen in the depth direction thereof in such a manner that the specimen is scanned by a primary ion beam for etching to derive therefrom information on the specimen such as charged particle beams or electromagnetic waves in an attempt to analyze the surface of the specimen in succession with the progress of the etching, wherein the etching of the specimen is effected by scanning the primary ion beam over an area larger than and inclusive of a region to be analyzed and the information generated from the specimen surface only when the primary ion beam passes through the region to be analyzed which is preset is detected, thereby making free from influences from the side wall of a hole produced on the specimen by the etching to improve the precision of analysis in the depth direction of the specimen. |
