发明名称 PROCESS FOR W ORKING PARALLEL PLANE OF WAFER
摘要 PURPOSE:To shorten a bonding step and to work a wafer at a high preciseness, by forming an elastic film having a high preciseness of plane of surface on a surface of a hard substrate having a micro pore, and by sucking and maintaining the wafer temporarily through water and the like in the wafer.
申请公布号 JPS52155494(A) 申请公布日期 1977.12.23
申请号 JP19760072266 申请日期 1976.06.21
申请人 发明人
分类号 B24B37/30;H01L21/304 主分类号 B24B37/30
代理机构 代理人
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