| 摘要 |
<p>Plant for the continuous electrolytic treatment of metal strip in a tank contg. flat plate electrode(s) and guides keeping the moving strip at a constant distance from, and parallel to the electrode(s). The electrode(s) has holes or slots distributed over its surface, and a pump is used to feed electrolyte through at least some of the holes and towards the surface of the strip to agitate the liq. The holes are pref. uniformly distributed over the electrode(s); alternatively slots with a length equal to the strip width and located at 90 degrees to the direction of strip travel can be used. A second pump is pref. employed to create electrolyte flow parallel with the direction of strip travel. The treatment is e.g. a.c. or d.c. treatment for cleaning, descaling, roughening or polishing; anodising or electroplating. Up to 600 A/dm2 or more can be used.</p> |
