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发明名称
ELECTRON BEAM EXPOSURE APPARATUS
摘要
申请公布号
JPS52141180(A)
申请公布日期
1977.11.25
申请号
JP19760058194
申请日期
1976.05.20
申请人
NIPPON ELECTRON OPTICS LAB
发明人
TANAKA KAZUMITSU
分类号
H01L21/027;G03F7/20;H01L21/26
主分类号
H01L21/027
代理机构
代理人
主权项
地址
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