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发明名称
VERFAHREN ZUM HERSTELLEN EINER ZONE EINES ERSTEN LEITFAHIGKEITSTYPS IN EINEM HALBLEITERKRISTALL VOM ZWEITEN, ZUM ERSTEN ENTGEGENGESETZTEN LEITFAHIGKEITSTYP
摘要
申请公布号
AT338335(B)
申请公布日期
1977.08.25
申请号
AT19710000825
申请日期
1971.02.01
申请人
SIEMENS AKTIENGESELLSCHAFT
发明人
分类号
H01L21/225;(IPC1-7):H01L21/22
主分类号
H01L21/225
代理机构
代理人
主权项
地址
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