PURPOSE:Ion current density in specimen surface is increased and etching speed is increased, whereby the time in analysis of depth direction is shortened and the sensitivity of detection is improved.
申请公布号
JPS5257884(A)
申请公布日期
1977.05.12
申请号
JP19750133070
申请日期
1975.11.07
申请人
HITACHI LTD
发明人
DOI HIROSHI;TOKIKUCHI KATSUMI;SAKUMICHI KUNIYUKI;KAMATA ICHIROU
