| 发明名称 |
METHOD OF INSPECTING PHOTO MASK PATTERNS* ETC* |
| 摘要 |
<p>PURPOSE:Presence or absence of any defect in patterns is automatically inspected, criteria for asessment of defects is made uniform and inspection time is considerably shortened.</p> |
| 申请公布号 |
JPS5254483(A) |
申请公布日期 |
1977.05.02 |
| 申请号 |
JP19750129205 |
申请日期 |
1975.10.29 |
| 申请人 |
HITACHI LTD |
发明人 |
NAKAGAWA KIYOSHI;IBE HIROYUKI |
| 分类号 |
H01L21/30;G01N21/88;G01N21/956;H01L21/027;H01L21/66 |
主分类号 |
H01L21/30 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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