Electron beam deflection system - performs variable scan for illuminating and machining radiation sensitive substrate

摘要

The device has a source of electrons or ions and means for the beam deflection. In order to produce a pattern in the treated substrate, the beam position and the period of dwell of the beam at a certain point of the substrate can be varied. Deflection means are used to move the beam in the orthogonal deflection directions (x, y), which correspond to the main edges of the structure to be irradiated and they are excited with triangular signals, whose difference frequency is small in comparison with the signal frequencies (fx, fy).